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Flash lampの製品一覧

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What can be done with Ushio's light: "Impurity Diffusion"

What can be done with Ushio's light: "Impurity Diffusion"

This is an introduction to practical examples of Ushio's light sources for light heating, which have a rich and comprehensive track record (impurity diffusion). 【Features】 ○ Light sources used: Xenon flash lamp, halogen heater lamp ○ In the semiconductor process, implantation is performed on the source drain, followed by an annealing process to activate the doped impurities. ○ Utilizing the characteristics of the xenon flash lamp, it is possible to perform high-temperature annealing in a very short time frame (on the order of milliseconds) to extremely shallow depths (on the order of nm) compared to the previous active layer depth, thereby preventing impurity diffusion. ● For other functions and details, please contact us.

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Non-contact, so it's clean! High efficiency and energy-saving "flash lamp."

High efficiency / energy saving! It minimizes thermal damage to the substrate and allows for heating only the surface.

We would like to introduce the "Flash Lamp," which enables high throughput through bulk irradiation of large-area substrates. The light heating provided by this product utilizes the "absorption" characteristic among the material's properties of "reflection," "transmission," and "absorption" to achieve self-heating. Additionally, since it is non-contact, it maintains a clean atmosphere and is not limited by the heating environment, whether in the atmosphere or in a vacuum. 【Features】 ■ Bulk irradiation of large areas - Enables high throughput through bulk irradiation of large-area substrates. ■ High efficiency / energy saving - The wavelength from this product matches the absorption characteristics of Si, allowing for efficient heating. ■ Control of processing depth through pulse control - Minimizes thermal damage to the substrate and allows for heating of only the surface layer. *For more details, please refer to the related links or feel free to contact us.

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